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Semiconductor Application
Photomasks
The so-called photomask is a graphic master used in the photolithography process in the field of microelectronics manufacturing. It is composed of a Mask Pattern formed on the transparent substrate by a light-tight shading film, and the pattern is transferred to the product substrate through exposure.
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Product Detail

Photomasks are mainly used in the following areas:
IC(Integrated Circuit)
LSI(Large Scale IC), including Wafer process and IC Bumping, etc.
FPD(Flat Panel Display), including  PDP、LCD、LED、OLED, etc.
PCB(Printed Circuit Boards)
MEMS(Micro Electro Mechanical Systems)
 
Technical Specifications
Material Size Flatness(um) Parallelism(um)
L*W(mm) Tolerance(mm) Thickness(mm) Front Back
Soda/Fused Silica 3006(76*76) ±0.2 1.5±0.1 <5 <5 <5
Soda/Fused Silica 4006(101.4*101.4) ±0.2  
1.5±0.1
<5 <5 <5
Soda/Fused Silica 4009(101.4*101.4) ±0.2 2.3±0.1 <5 <5 <5
Soda/Fused Silica 5006(127*127) ±0.2 1.5±0.1 <5 <5 <5
Soda/Fused Silica 5009(127*127) ±0.2 2.3±0.1 <5 <5 <5
Soda/Fused Silica 6009(152*152) ±0.2 2.3±0.1 <10 <10 <10
Soda/Fused Silica 6025(152*152) ±0.2 6.35±0.1 <10 <10 <10
Soda/Fused Silica 7009(177.6*177.6) ±0.2 2.3±0.1 <10 <10 <10
Soda/Fused Silica 7012(177.6*177.6) ±0.2 3.05±0.1 <10 <10 <10
Soda/Fused Silica 8012(203*203) ±0.2 3.05±0.1 <10 <10 <10
Soda/Fused Silica 9012(228.6*228.6) ±0.2 3.05±0.1 <10 <10 <10

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